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Optimization of Long-Range Order in Solvent Vapor Annealed Poly(styrene)-block-poly(lactide) Thin Films for Nano lithography
Journal article   Peer reviewed

Optimization of Long-Range Order in Solvent Vapor Annealed Poly(styrene)-block-poly(lactide) Thin Films for Nano lithography

Andrew G. Baruth, Myungeun Seo, Chun Hao Lin, Kern Walster, Arjun Shankar, Marc A. Hillmyer and C. Leighton
ACS Applied Materials & Interfaces, Vol.6(16), pp.13770-13781
08/27/2014
PMID: 25029410

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