The stoichiometric displacement model and Langmuir and Freundlich adsorption

Journal article

Peer reviewed

X-D. Geng and Don M. Zebolsky

Journal of Chemical Education, Vol.79(3), pp.385-388

03/2002

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Title: The stoichiometric displacement model and Langmuir and Freundlich adsorption
Creators: X-D. Geng (Author)
Don M. Zebolsky (Author) - Creighton University
Publication Details: Journal of Chemical Education, Vol.79(3), pp.385-388
Number of pages: 385-388
Identifiers: 991005931106902656
Academic Unit: College of Arts and Sciences; Chemistry and Biochemistry
Resource Type: Journal article